Surface Analysis Books
IM Publications and SurfaceSpectra are jointly publishing a series of books on Surface Analysis. The first in the series is ToF-SIMS: Surface Analysis by Mass Spectrometry followed by Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy and now a 2nd Edition of ToF-SIMS: Materials Analysis by Mass Spectrometry
ToF-SIMS: Materials Analysis by Mass Spectrometry 2nd Edition
Edited by John C. Vickerman and David Briggs
Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is the most versatile of the surface analysis techniques that have been developed during the last 30 years. Current instrumentation provides a powerful combination of capabilities for molecular detection and trace element determination, imaging and microanalysis, and shallow depth profiling. This is the Second Edition of the first book to be dedicated to the subject and the treatment is comprehensive. Following overview and historical chapters, there are sections devoted to instrumentation and sample handling, fundamentals and molecular dynamics simulations, optimisation methods–including laser post-ionisation of sputtered neutrals, data interpretation and analytical applications.
All the contributors are internationally recognised as leaders in their respective fields and come from both Europe, USA and Asia.
Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
Edited by David Briggs and John T. Grant
If Briggs and Seah has been your guide in the past, you will want this book.
Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS or ESCA) are well-established techniques for surface analysis and also (when combined with sputter depth profiling) for thin film and interface analysis.
This book is the first comprehensive treatment of the subject for over 10 years, during which time there have been many advances in instrumentation and performance, the understanding of electron spectroscopy fundamentals, experimental methodology and data interpretation, all of which have markedly enhanced the capabilities of AES and XPS. This new information is now integrated into a thoroughly up-to-date reference volume for the benefit of researcher and practical analyst alike.
31 chapters cover the following areas: perspectives and history; basic principles and spectral features; instrumentation, sample handling and beam effects; electron transport and surface sensitivity; quantification; spectral interpretation and structural effects; depth profiling; imaging; and developing aspects. There are also extensive Appendices of reference data.
The authors are all internationally recognised and come from Australia, Europe, Japan and the USA.